Electronic grade silicane is an electronic gas used in semiconductors, mainly used in amorphous silicon growth, epitaxial growth, chemical vapor deposition, diffusion, ion implantation and other processes, widely used in semiconductors, integrated circuits, solar cells and other fields. This industry standard is applicable to the electronic grade silicane prepared by magnesium silicide method (Comatose method), silane direct synthesis method and hexachloroethicane reduction method. It will fill the gap in the electronic grade silicane product standard, clarify the technical indicators of electronic grade silicane, standardize the product quality control requirements of different research units, and contribute to the promotion and application of domestic ethicane. Thus supporting the rapid development of the domestic semiconductor industry chain.
It is reported that the industry standard is an important breakthrough in the high-quality development of the municipal standardization Institute’s service strategy for emerging industries, promoting the transformation of enterprises’ scientific and technological achievements into technical standards, and is also an important achievement after Wuhu City was approved to build the Anhui Provincial Standardization Innovation Center (semiconductor precursor materials), opening up a situation for promoting the standardization research and application of semiconductor precursor materials.
