Trimethyladium is a chemical substance with a molecular weight of 159.9. It is mainly used for epitaxial growth and organic synthesis, and can also be used for chemical vapor deposition.
Trimethylindium application
Trimethylindium (TMIn) has a wide range of applications in many fields, the following is the specific application scenario:
In the field of organic synthesis: trimethylindium is often used as an organic synthesis catalyst, which can catalyze the addition reaction of olefins, alkynes and other compounds, and also has a good catalytic effect on reactants with large steric hindrance. In addition, trimethylindium can also catalyze the formation of carbon-carbon bond reactions, such as nucleophilic addition reaction, Michael addition reaction.
Semiconductor material field: trimethylindium can be used to grow high-quality indium compound materials, such as indium phosphide, indium gallium phosphide and so on. These materials can be used to prepare high-performance optoelectronic devices, such as leds.
In the field of optoelectronic devices: trimethylindium can be used to prepare organic light-emitting diodes (OLeds) and other devices. OLED is a new type of photoelectric device, which has the characteristics of low power consumption, high brightness and high contrast, and is widely used in display, lighting and other fields.
Metal-organic chemical vapor deposition (MOCVD) process: trimethylindium is often used as a raw material for epitaxial growth of indium phosphide and other indium-containing compound semiconductor optoelectronic functional materials in MOCVD process.
Physicochemical properties of Trimethylindium
The physicochemical properties undergo intense reactions with alcohols and acids with active hydrogen. It forms coordination compounds with methyl ether, trimethylphosphane, trimethylarsenide, etc., but its stability is worse than that of gallium. Light can easily cause the decomposition of trimethyl indium, and it is necessary to store it in a cool and dry place for long-term storage. Application: Organic synthesis, chemical vapor deposition, and growth. Using trimethyl indium as a high-quality solid indium source for semiconductor compound deposition, it is used in high-performance and high-efficiency Chemicalbook solar cells using light-emitting diodes, laser diodes, and transistors. Prepare in a reactor filled with inert gas, add indium magnesium alloy raw materials, and gradually add halogenated alkanes under stirring conditions in the presence of ether solvents. Control the solvent reflux rate by controlling the droplet acceleration of halogenated alkanes. After the reaction is completed, the solvent is evaporated, and then under reduced pressure, a complex of trimethyl indium and ether is obtained. Finally, trimethyl indium is dissociated. The production method uses In and Mg as raw materials to react with CH3I, and after dissociation Purification methods such as fractionation can produce high-purity trimethyl indium.
Trimethylsilane storage conditions
Due to the toxic nature of trimethyl indium and its decomposition products, inhalation should be avoided. Trimethylindium is unstable when heated above 140 ℃. Note that trimethylindium should not be heated beyond 80 ℃. Seek medical attention immediately after emergency contact with a large amount of trimethylindium and its by-products.
Store in a dry place. Store in a closed container. Dispose of contents/containers according to local/regional/national/international regulations.Keep away from heat sources, hot surfaces, sparks, open flames, and other ignition sources. No Smoking.
The cargo box and loading equipment are grounded and equipotentially connected, using explosion-proof electrical/ventilation/lighting equipment, wearing protective gloves/clothing/goggles/masks, and not in contact with water
